Contamination monitoring and control techniques for use with...

Details Contamination monitoring and control techniques for use with... Contamination monitoring and control techniques for use with...

2006-11-16

2010-02-16

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Transparent or translucent material

C356S239100

Reexamination Certificate

active

07663747

ABSTRACT:
A technique is provided for monitoring and controlling surface contaminants on optical elements contained within the optical path (or sub-path) of an optical metrology instrument. The technique may be utilized in one embodiment in such a manner as to not require that additional components and/or instrumentation be coupled to, or integrated into, existing metrology equipment. Surface contaminants on optical elements within an optical metrology instrument are monitored so that cleaning procedures can be performed as deemed necessary. The cleaning procedures may include the use of exposing the optical elements to optical radiation. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.

REFERENCES:
patent: 5344522 (1994-09-01), Yagi et al.
patent: 5510624 (1996-04-01), Zaluzec
patent: 5565038 (1996-10-01), Ashley
patent: 5584963 (1996-12-01), Takahashi
patent: 5669979 (1997-09-01), Elliott et al.
patent: 5814156 (1998-09-01), Elliott et al.
patent: 6015759 (2000-01-01), Khan et al.
patent: 6165273 (2000-12-01), Fayfield et al.
patent: 6261853 (2001-07-01), Howell et al.
patent: 6274874 (2001-08-01), Sidhu
patent: 6288769 (2001-09-01), Akagawa et al.
patent: 6387602 (2002-05-01), Hayden et al.
patent: 6403966 (2002-06-01), Oka
patent: 6433877 (2002-08-01), Watanabe et al.
patent: 6490305 (2002-12-01), Govorkov et al.
patent: 6496257 (2002-12-01), Taniguchi et al.
patent: 6519045 (2003-02-01), Kwon
patent: 6714300 (2004-03-01), Rosenewaig et al.
patent: 6724460 (2004-04-01), Van Schaik et al.
patent: 6726886 (2004-04-01), Shiramizu et al.
patent: 6740247 (2004-05-01), Han et al.
patent: 6813026 (2004-11-01), McAninch
patent: 6891627 (2005-05-01), Levy et al.
patent: 6907058 (2005-06-01), Vogler et al.
patent: 6914208 (2005-07-01), Shimizu et al.
patent: 6930771 (2005-08-01), Rosenewaig et al.
patent: 7006222 (2006-02-01), Krishnan
patent: 7067818 (2006-06-01), Harrison
patent: 7068370 (2006-06-01), Rosenewaig et al.
patent: 7126131 (2006-10-01), Harrison
patent: 7202951 (2007-04-01), Janik et al.
patent: 7253901 (2007-08-01), Janik et al.
patent: 2003/0231302 (2003-12-01), Hunt
patent: 2004/0150820 (2004-08-01), Nikoonahad et al.
patent: 2004/0165165 (2004-08-01), Yun et al.
patent: 2005/0001172 (2005-01-01), Harrison
patent: 2005/0072943 (2005-04-01), Yamanaka et al.
patent: 2005/0117226 (2005-06-01), Yamamoto
patent: 2005/0231719 (2005-10-01), Rosenewaig et al.
patent: 2006/0228897 (2006-10-01), Timans
Search Report, PCT/US07/06765, Mar. 11, 2008, 2 pgs.
Copending Application, “Contamination Monitoring And Control Techniques For Use With An Optical Metrology Instrument”, U.S. Appl. No. 11/600,414, filed Nov. 16, 2006, 58 pgs.
Copending Application, “Contamination Monitoring And Control Techniques For Use With An Optical Metrology Instrument”, U.S. Appl. No. 11/600,413, filed Nov. 16, 2006, 54 pgs.
Okoroanyanwu et al., “Contamination Monitoring And Control On ASML MS-BII l57Nm Exposure Tool”, AMD, California, IMEC, Belgium, 2004, 13 pgs.
Kunz et al., “Experimentation And Modeling Of Organic Photocontamination On Lithographic Optics”, J. Vac., Sci. Technology, B18(3), May/Jun. 2000, pp. 1306-1313.

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