Contaminating-element analyzing method and apparatus of the same

Details Contaminating-element analyzing method and apparatus of the same Contaminating-element analyzing method and apparatus of the same

1993-09-07

1995-06-06

Dzierzynski, Paul M.

X-ray or gamma ray systems or devices

Specific application

Fluorescence

378 44, G01N 23223

Patent

active

054229251

ABSTRACT:
A contaminating-element analyzing method and an apparatus of the same are disclosed. Differential smoothing process is performed for a measured waveform of a fluorescent X-ray obtained from an object to be measured so as to detect a peak of the measured waveform, the object containing a contaminating element. A model function with variables which are initial parameters with respect to each peak of the measured waveform is provided so as to constitute a model waveform. A nonlinear optimizing process is performed using the method of least squares of the model waveform and the measured waveform so as to decide initial parameters of each model function and to obtain discriminated waveforms. A contaminating element is identified corresponding to each of the discriminated waveforms and obtaining an integrated intensity of a discrete waveform of each of the identified contaminating elements. A background intensity is obtained corresponding to a measured waveform of a fluorescent X-ray obtained from a non-contaminating object which does not contain any contaminating element. The background intensity is subtracted from an integrated intensity of a discrete waveform of each contaminating element.

REFERENCES:
patent: 4188 (1897-01-01), Thomson et al.
patent: 3764805 (1973-10-01), Alley
patent: 4009390 (1977-02-01), Sutterlee et al.
patent: 4015124 (1977-03-01), Page
patent: 5365563 (1994-11-01), Kira et al.

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