Contaminating-element analyzing method

Details Contaminating-element analyzing method Contaminating-element analyzing method

1993-11-29

1996-03-05

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Fluorescence

378 49, G01N 23223

Patent

active

054974070

ABSTRACT:
A contaminating-element analyzing method enables precise identification of contaminating elements and precise calculation of concentrations thereof by eliminating a broad peak waveform due to Rayleigh scattering and Compton scattering and a background waveform from a measured waveform of a contaminated sample. A blank sample or samples are irradiated by an X-ray beam under a constant condition to obtain a plurality of measured waveforms of fluorescent X-rays, and the plurality of measured waveforms are averaged to obtain a blank waveform. Then a contaminated sample is irradiated by the X-ray beam under the same condition as that for the blank sample to obtain a measured waveform of fluorescent X-rays. The blank waveform is subtracted from the measured waveform of contaminated sample, and then the contaminating elements are identified and the concentrations thereof are calculated on the basis of the waveform data after the subtraction process.

REFERENCES:
patent: 3662882 (1972-05-01), Obermayer

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