Containing an arylsulfonic acid, a phenol and a naphalenic solve

Details Containing an arylsulfonic acid, a phenol and a naphalenic solve Containing an arylsulfonic acid, a phenol and a naphalenic solve

1988-02-03

1989-07-04

Albrecht, Dennis

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

134 3, 134 38, 252170, 252171, 252558, 252DIG8, 430329, 430331, C09D 900, C09D 904, C23D 1700, H01L 21465

Patent

active

048448320

ABSTRACT:
The remover solution for photoresist layers comprises: (a) from 30 to 70% by weight of an aromatic hydrocarbon compound or a combination of aromatic hydrocarbon compounds having a flash point of 70.degree. C. or higher containing at least a half amount of a naphthalenic compound selected from the group consisting of naphthalene, methyl naphthalenes and dimethyl naphthalenes; (b) from 5 to 40% by weight of a phenolic compound; and (c) from 10 to 50% by weight of an arylsulfonic acid. The remover solution is effective for a variety of photoresist compositions with less problems in respect to the workers' health and danger of fire and explosion than conventional remover solutions.

REFERENCES:
patent: 3582401 (1971-06-01), Berilla
patent: 3871929 (1975-03-01), Schevey
patent: 4070203 (1978-01-01), Neisius
patent: 4165294 (1979-08-01), Vander Mey
patent: 4165295 (1979-08-01), Vander Mey
patent: 4215005 (1980-07-01), Vander Mey
patent: 4221674 (1980-09-01), Vander Mey
patent: 4242218 (1980-12-01), Vander Mey
patent: 4395348 (1983-07-01), Lee

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