Container for masks and pellicles

Details Container for masks and pellicles Container for masks and pellicles

1984-01-30

1985-04-16

Dixson, Jr., William T.

Special receptacle or package

For plate or sheet

Fragile or sensitive

206332, B65D 8548, B65D 8116

Patent

active

045110387

ABSTRACT:
Pellicles such as those shown in U.S. Pat. No. 4,131,363 are attached to photographic masks used in suitable exposure equipment to transfer a desired pattern on the mask to a photosensitive surface, such as an integrated circuit wafer coated with a photoresist. The pellicle removes impurities such as dust from the plane of the mask a sufficient distance so that the impurity is not focused on the photosensitive surface. The present invention provides a container in which a mask with a pellicle attached may be stored between uses in a dust-free atmosphere, with the fragile surface of the pellicle protected. Initially, the pellicle, before being attached to the mask, may be supported on a detachable tray positioned in the same container during transportation from its place of manufacture and storage to the place where it is applied to the mask.

REFERENCES:
patent: 3482682 (1969-12-01), Cronkhite
patent: 3489265 (1970-01-01), Puente
patent: 3615006 (1971-10-01), Freed

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