Container for liquid metal organic compound

Gas and liquid contact apparatus – Fluid distribution – Valved

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

261120, 2611211, B01F 304

Patent

active

055891101

ABSTRACT:
A metal organic compound container apparatus for containing a liquid metal organic compound, receiving a carrier gas, and producing a carrier gas stream saturated with vapor of the metal organic compound including a container for containing a liquid metal organic compound; an inlet pipe for introducing a carrier gas into the container, the inlet pipe having an end for immersion in the metal organic compound; a carrier gas flow rate controller for controlling carrier gas flow into the inlet pipe; a first exhaust pipe for exhausting carrier gas from the container at a first flow rate, the first exhaust pipe having an end not contacting the metal organic compound; a first gas flow rate controller for controlling one of pressure and the first flow rate of the carrier gas through the first exhaust pipe; a second exhaust pipe for exhausting carrier gas from the container at a second flow rate, the second exhaust pipe having an end not contacting the metal organic compound; and a second gas flow rate controller for controlling the second flow rate.

REFERENCES:
patent: 2405494 (1946-08-01), Dupuy
patent: 2921844 (1960-01-01), Hutchison
patent: 3049850 (1962-08-01), Smith
patent: 3552725 (1971-01-01), Ray
patent: 4192836 (1980-03-01), Bartscher et al.
patent: 4410467 (1983-10-01), Wentworth, Jr.
patent: 4533410 (1985-08-01), Ogura et al.
patent: 4761269 (1988-08-01), Conger et al.
patent: 4851016 (1989-07-01), Rylander
patent: 4950621 (1990-08-01), Irvine et al.
patent: 4980204 (1990-12-01), Fujii et al.
patent: 5069930 (1991-12-01), Hussla et al.
patent: 5124088 (1992-06-01), Stumphauzer
patent: 5190913 (1993-03-01), Higashiyama et al.
patent: 5200388 (1993-04-01), Abe et al.
patent: 5304247 (1994-04-01), Kondo et al.
patent: 5336356 (1994-08-01), Ban et al.
patent: 5354516 (1994-10-01), Tomita
Tompa et al, "A Parametric Investigation Of GaAs Epitaxial Growth Uniformity In A High Speed, Rotating-Disk MOCVD Reactor", Journal of Crystal Growth, vol. 93, 1988, pp. 220-227.
Tompa et al, "MOVPE Growth Of II-VI Compounds In A Vertical Reactor With High-Speed Horizontal Rotating Disk", Journal of Crystal Growth, vol. 107, 1991, pp. 198-202.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Container for liquid metal organic compound does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Container for liquid metal organic compound, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Container for liquid metal organic compound will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1139698

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.