Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1989-11-03
1991-08-06
Valentine, Donald R.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
2065245, C25D 1702, B65D 8102
Patent
active
050375202
ABSTRACT:
A container in which minerals such as copper are purified in an electrolytic process includes bottom, end and side walls for containing a corrosive electrolyte, such as, a sulphuric or hydrochloric acid solution. The bottom, end and side walls of the container are composed of a cured mixture of 10-19 percent of a modified, vinylester or polyester thermo-setting resin and the balance consisting of 1/4"-1/64" inch crystalline silica, fine silica sand or silica flour and glass beads approximately four microns in size and/or mica flakes about 1/64" in size or 1/4"-1/8" chopped fiberglass strands. The container is formed in a continuous pouring process and includes non-conductive reinforcing rods.
REFERENCES:
patent: 2404126 (1946-07-01), Duddy
patent: 2816070 (1957-12-01), Buchanan
patent: 3401109 (1968-09-01), Anderson
patent: 3403091 (1968-09-01), Currey et al.
patent: 3409536 (1968-11-01), Barber et al.
patent: 3584758 (1971-06-01), Moore
patent: 3679568 (1982-07-01), Westerlund
patent: 3763083 (1973-10-01), Grotheer
patent: 4166536 (1979-04-01), Roberts et al.
patent: 4213842 (1980-07-01), Defresne
patent: 4621010 (1986-11-01), Wadsworth
patent: 4885071 (1989-12-01), Harry et al.
High Quality EFCO Form Produces Complicated Concrete Structures in Form Marks, Spring/Summer 1982.
Intercompany Telex of AT&T Nassau Metals, S. Carouna, U.S.A.
Electrolytic Cells at Cominco's Lead and Zinc Operations Report.
Harry John O.
Verhagen George
LandOfFree
Container for corrosive material does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Container for corrosive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Container for corrosive material will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1984918