Contained object transfer system

Details Contained object transfer system Contained object transfer system

2008-12-19

2011-12-27

Rodriguez, Saul (Department: 3652)

Material or article handling

Apparatus for moving material between zones having different...

C414S222020

Reexamination Certificate

active

08083456

ABSTRACT:
A so-called transfer chamber in a semiconductor processing apparatus in which an FIMS system is secured is separated into a second chamber in which a transfer robot is disposed and a first chamber that is minute and includes a door capable of holding a cap of a pod as the FIMS system. In the second chamber, higher pressure than in the first chamber is maintained by a minute amount of nitrogen. In the first chamber, usually, a down flow of clean air is used via the FFU. When the wafer is transferred, a down flow of nitrogen is used. Thus, oxidation gas in the transfer chamber and released substances caused the FFU can be decreased.

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U.S. Appl. No. 12/471,987, filed May 26, 2009, Okabe, et al.

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