Contact shock dampening and development nip forming...

Details Contact shock dampening and development nip forming... Contact shock dampening and development nip forming...

2005-02-01

2005-02-01

Chen, Sophia S. (Department: 2852)

Electrophotography

Image formation

Development

C399S113000, C399S119000

Reexamination Certificate

active

06850723

ABSTRACT:
A contact shock dampening and development nip forming apparatus for developers includes a unit to dampen a contact shock and to form a development nip installed on both ends of a developing roller to be disposed between a photosensitive body and the developing roller. Accordingly, the contact shock dampening and development nip forming apparatus absorbs shocks applied to the photosensitive body from the developing roller upon changing the developers, to thereby protect the photosensitive layer of the photosensitive body and extend the lifespan of the photosensitive body. The apparatus also maintains a thickness of the development nip to thereby obtain a steady image quality, even though the developing roller and/or the photosensitive body may be formed of solid substances.

REFERENCES:
patent: 5930575 (1999-07-01), Fornalik et al.
patent: 6070031 (2000-05-01), Haneda et al.
patent: 6079732 (2000-06-01), Nakajima et al.
patent: 6694118 (2004-02-01), Yoo
patent: 20020110386 (2002-08-01), Kanno et al.
patent: 20030007808 (2003-01-01), Hiroki
patent: 20030147672 (2003-08-01), Ahn
patent: 63-058469 (1988-03-01), None
patent: 01-225974 (1989-09-01), None
patent: 03-163576 (1991-07-01), None
patent: 04-025866 (1992-01-01), None
patent: 08-335023 (1996-12-01), None
patent: 10-326044 (1998-12-01), None

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