Contact lithographic fabrication of patterns on large optics

Details Contact lithographic fabrication of patterns on large optics Contact lithographic fabrication of patterns on large optics

1988-11-23

1990-01-30

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 1, 430321, 430323, G03F 100

Patent

active

048973254

ABSTRACT:
An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.

REFERENCES:
patent: 3537854 (1970-11-01), Grobin et al.
patent: 3694080 (1972-09-01), Malsky
patent: 4388388 (1983-06-01), Kornbau et al.
patent: 4547037 (1985-10-01), Case

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