Contact for use in an integrated circuit and a method of...

Electrical connectors – Adapted to cooperate with duplicate connector – Contact intermeshable with duplicate mating contact

Reexamination Certificate

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Reexamination Certificate

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06910907

ABSTRACT:
The present invention provides a contact for use in an integrated circuit, a method of manufacture therefor, and an integrated circuit including the aforementioned contact. The contact, in accordance with the principles of the present invention, may include a via located in a substrate, and a contact plug located in the via, wherein the contact plug has a first portion having a notch removed therefrom and a second portion filling the notch.

REFERENCES:
patent: 5844318 (1998-12-01), Sandhu et al.
patent: 6781215 (2004-08-01), Heerman
patent: 6794272 (2004-09-01), Turner et al.

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