Contact assemblies for electrochemical processing of...

Details Contact assemblies for electrochemical processing of... Contact assemblies for electrochemical processing of...

2007-11-13

2007-11-13

Bell, Bruce F. (Department: 1746)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S280000, C204S286100, C204S297010, C204S297060, C204S297070, C204S297080, C204S297090, C204S297100, C204S297140

Reexamination Certificate

active

10497670

ABSTRACT:
Contact assemblies for electrochemical processing of microelectronic workpieces. The contact assembly (400) can comprise a support member (410) that includes an inner wall (412) which defines an opening (414) configured to receive the workpiece and a plurality of contacts (420). The individual contacts (420) include a conductor (440) and a cover (430). The conductor (440) can comprise a proximal section (435) projecting inwardly into the opening (414) relative to the support member (410), a distal section (436) extending from the proximal section (435), and an inert exterior (444) at least at the distal section (436). The cover (430) comprises a dielectric element that covers at least the proximal section of the conductor, but does not cover at least a portion of the distal section of the core. The exposed portion of the distal section of the core, accordingly, defines a conductive contact site for contacting a conductive layer (e.g., a seed layer) on the workpiece.

REFERENCES:
patent: 5522975 (1996-06-01), Andricacos et al.
patent: 6228231 (2001-05-01), Uzoh
patent: 6251236 (2001-06-01), Stevens
patent: 6939448 (2005-09-01), Batz et al.
patent: 6962649 (2005-11-01), Wilson et al.

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