Constructive nanolithography

Details Constructive nanolithography Constructive nanolithography

2008-05-20

2008-05-20

Feely, Michael J (Department: 1796)

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C428S446000, C428S447000, C428S448000, C428S450000, C427S097300, C427S098400, C427S402000, C427S458000, C427S466000, C427S472000, C427S532000, C977S932000, C977S943000

Reexamination Certificate

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09959207

ABSTRACT:
A patterned organic monolayer or multiplayer film self-assembled on a solid substrate, the pattern consisting in a site-defined surface chemical modification non-destructively inscribed in the organic monolayer or multilayer by means of an electrically biased conducting scanning probe device, stamping device and/or liquid metal or metal alloy or any other device that can touch the organic monolayer or multilayer surface and inscribe therein a chemical modification pattern upon application of an electrical bias.

REFERENCES:
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patent: 5922214 (1999-07-01), Liu et al.
patent: 6048623 (2000-04-01), Everhart et al.
patent: 0 481 362 (1992-04-01), None
R. Maoz et al., “‘Constructive Nanolithography’: Inert Monolayers as Patternable Templates for In-Situ Nanofabrication of Metal-Semiconductor-Organic Surface Structures—A Generic Approach”,Advanced Materials, 2000, pp. 725-731, vol. 12, No. 10.
R. Maoz et al., “‘Constructive Nanolithography’: Site-Defined Silver Self-Assembly on Nanoelectrochemically Patterned Monolayer Templates”,Advanced Materials, 2000, pp. 424-429, vol. 12, No. 6.
R. Maoz et al., “Nanoelectrochemical Patterning of Monolayer Surfaces: Toward Spatially Defined Self-Assembly of Nanostructures”,Advanced Materials, 1999, pp. 55-61, vol. 11, No. 1.
F. Keith Perkins et al., “Proximal Probe Study of Self-Assembled Monolayer Resist Materials”,J. Vac. Sci. Technol. B, 1994, pp. 3725-3730, vol. 12, No. 6.

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