Constituent members of a semiconductor element-manufacturing app

Details Constituent members of a semiconductor element-manufacturing app Constituent members of a semiconductor element-manufacturing app

1980-06-25

1984-01-03

Bernstein, Hiram H.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including specific material of construction

156DIG83, C30B 2510

Patent

active

044241933

ABSTRACT:
The constituent members of a semiconductor element-manufacturing apparatus which are formed by depositing a silicon carbide layer on a carbon substrate, and wherein a peak X-ray diffraction on the (200) plane of the silicon carbide layer has a half value width of 0.35.degree. or less as measured by the C.sub.u -K.sub..alpha. ray used in the X-ray diffraction analysis.

REFERENCES:
patent: 2431326 (1947-11-01), Heyroth
patent: 3011912 (1961-12-01), Gareis et al.
patent: 3306705 (1967-02-01), Leineweber
patent: 3459504 (1969-08-01), Bracken et al.
patent: 3758672 (1973-09-01), Lewis
patent: 3927181 (1975-12-01), Niimi et al.
patent: 4166841 (1979-09-01), Noakes et al.

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