Valves and valve actuation – Electrically actuated valve – Balanced valve
Reexamination Certificate
2006-05-09
2006-05-09
Yu, Justine R. (Department: 3751)
Valves and valve actuation
Electrically actuated valve
Balanced valve
Reexamination Certificate
active
07040595
ABSTRACT:
A constant flow rate expansion valve includes a refrigerant passage having a fixed flow path cross-sectional area smaller than that of a refrigerant inlet, a differential pressure control valve for controlling the differential pressure (P1−P2) between an inlet pressure P1and an intermediate pressure P2generated by refrigerant flowing through the refrigerant passage to be constant, and a solenoid capable of setting the differential pressure by the value of an electric current externally supplied. In the differential pressure control valve, a piston and a valve element integrally formed with each other sense the differential pressure (P1−P2), change a gap between the valve element and a valve seat such that the differential pressure is held constant, and adiabatically expand the refrigerant at the gap.
REFERENCES:
patent: 2417994 (1947-03-01), Sheets
patent: 2477897 (1949-08-01), Ray
patent: 4717116 (1988-01-01), Ishigaki
patent: 5117647 (1992-06-01), Valbjorn
patent: 5901742 (1999-05-01), Kleppner et al.
patent: 6422308 (2002-07-01), Okawara et al.
patent: 6658877 (2003-12-01), Kjøng-Rasmussen
patent: 2002/0053652 (2002-05-01), Freisinger et al.
patent: 2001/153495 (2001-06-01), None
Patent Abstracts of Japan, Publication No. 2001-153495, dated Jun. 8, 2001/Discussed in the specification.
Le Huyen
TGK Co. Ltd.
Westerman Hattori Daniels & Adrian LLP
Yu Justine R.
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