Measuring and testing – Coating material: ink adhesive and/or plastic
Patent
1995-04-11
1996-08-20
Chilcot, Richard
Measuring and testing
Coating material: ink adhesive and/or plastic
73 81, 73866, G01N 334
Patent
active
055467970
ABSTRACT:
A Constant-Depth Scratch Test (CDST) technique to quantitatively determine he shear strength of interfaces between thin metallic or non-metallic films and metal or ceramic substrates is revealed. The test overcomes two problems associated with other types of scratch tests, namely the instrumental complexity required for real-time detection of interfacial failure, and the inability to quantify interfacial strength. These problems are circumvented by maintaining a constant depth during scratching through the coating and the substrate, monitoring the horizontal and vertical forces to sustain the constant depth scratch, and finally by using a model to analyze the test results to quantify the interfacial shear strength. Unlike other scratch tests, this test is capable of measuring interfacial shear strength as a function of position on the film-substrate sample.
REFERENCES:
patent: 4606225 (1986-08-01), Thomason et al.
patent: 4853777 (1989-08-01), Hupp
patent: 4856326 (1989-08-01), Tsukamoto
patent: 4878114 (1989-10-01), Huynh et al.
patent: 4934185 (1990-06-01), Nishiyama et al.
patent: 5255562 (1993-10-01), Yamamoto et al.
patent: 5283642 (1994-02-01), Sarr
Dutta Indranath
Lascurain David P.
Chilcot Richard
Garvert William C.
Lincoln Donald E.
Noori Max
The United States of America as represented by the Secretary of
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