Conical baffle for semiconductor furnaces

Details Conical baffle for semiconductor furnaces Conical baffle for semiconductor furnaces

1998-06-08

1999-10-05

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

C23C 1600

Patent

active

059617250

ABSTRACT:
An apparatus for producing thin film coatings and/or dopant levels on semiconductor wafers or other substrates with improved film growth uniformity (of thickness and composition) and/or dopant uniformity is provided. The apparatus is positioned in a furnace tube between the wafers and a gas inlet. The apparatus comprises a conical shaped baffle.

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patent: 5651944 (1997-07-01), Schulz et al.
patent: 5792701 (1998-08-01), Wang et al.

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