Configurations, materials and wavelengths for EUV lithium plasma

Details Configurations, materials and wavelengths for EUV lithium plasma Configurations, materials and wavelengths for EUV lithium plasma

1997-03-11

1999-10-05

Church, Craig E.

X-ray or gamma ray systems or devices

Source

Electron tube

378119, 250504, H01J 3500

Patent

active

059636165

ABSTRACT:
This invention relates to Lithium Plasma discharge sources, and in particular to methods of making and producing pulsed and continuous discharge sources for plasma soft-x-ray or EUV projection lithography. Specifically, novel configurations, metal and ceramic material combinations and efficient wavelengths over and including 11.4 nm are disclosed for EUV lithium plasma discharge lamps.

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