Configuration for determining a concentration of...

Details Configuration for determining a concentration of... Configuration for determining a concentration of...

2005-08-16

2005-08-16

Raevis, Robert (Department: 2856)

Measuring and testing

Inspecting

Reexamination Certificate

active

06928892

ABSTRACT:
A configuration for measuring the concentration of contaminating particles at high time resolution in the mini environments of loading and unloading chambers of processing appliances in semiconductor fabrication includes a probe, a movement unit for the probe, a particle detector, vacuum pump and a control unit. Reaching critical layer thicknesses of disk carriers or boats in ovens, and maladjustments of handling systems for wafers, masks, flat panel displays and other disc-like objects can be detected in terms of the cause and quantified immediately. The movement unit moves the probe to a desired position in the loading and unloading chamber as a reaction to the positioning of the handling system. A method of operating the configuration is also provided.

REFERENCES:
patent: 6303398 (2001-10-01), Goerigk
patent: 05 306 988 (1993-11-01), None
patent: 08 316 115 (1996-11-01), None
patent: 2000 019 095 (2000-01-01), None

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