Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-06-14
2005-06-14
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298150, C204S298250, C204S298230, C204S298270, C204S298280, C118S719000, C118S7230AN, C118S7230VE, C118S7230EB, C118S7230MP, C118S7230ER, C118S727000, C118S730000
Reexamination Certificate
active
06905582
ABSTRACT:
An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The configurable vacuum system includes a vacuum table assembly, a mechanical drive, an electrical feed through, a filament, and a vacuum chamber. The vacuum table assembly may include a support frame, a sliding means, such as a roller or rollers, an insulated surface, and a platform operable to rotate and support the substrate. The mechanical drive is operable to rotate the platform, the electrical feed through provides an electrical signal to the substrate, and the filament is positioned relative the substrate. The vacuum chamber includes a main opening, an internal volume, and a receiving means, such as a railing or member, operable to receive and support the vacuum table assembly within the internal volume of the vacuum chamber and through the sliding means of the vacuum table assembly.
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Pending U.S. patent application 08/573,870; inventor: White (et al?)—Applicants do not have a copy.
Harrington Craig D.
Hopkins Daniel N.
Kidd Jerry D.
Basic Resources Inc.
Hunton & Williams LLP
McDonald Rodney G.
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