Configurable metrology device that operates in reflectance...

Optics: measuring and testing – Of light reflection

Reexamination Certificate

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C356S073000, C356S432000

Reexamination Certificate

active

06842251

ABSTRACT:
A metrology system includes a sample holder and a backside reflective element. The backside reflective element causes light that is transmitted through the sample to be reflected and transmitted a second time, in the opposite direction, through the sample. A variable collection range can be adjusted to place the sample, the reflective element or both within the collection range. The collection range is the range of focused light that will be detected. The system can be controlled to move one or both of the sample and the reflective element in or out of the collection range or to alter the optics to adjust the collection range so that one or both of the sample and reflective element are in the collection range. Thus, the metrology system can be configured to operate in reflectance mode, transmittance mode or a mixed reflectance/transmittance mode.

REFERENCES:
patent: 4999010 (1991-03-01), Mattson et al.
patent: 5889593 (1999-03-01), Bareket
patent: 6075612 (2000-06-01), Mandella et al.
patent: 6084662 (2000-07-01), Seaburn
patent: WO 0012961 (2000-03-01), None
Gamsky, C. et al., “Quantitative analysis of chemically amplified negative photoresist using mirror-backed infrared reflection absorption spectroscopy”SPIE vol. 2438, pp. 143-152.
Gamsky, C., “Reflectance FT-1R For Monitoring Chemical Reactions In Chemically Amplified Photoresists For 0.25 μm X-Ray Lithography” UMI Dissertation Services, at the University of Wisconsin-Madison (1995), pp. 1-250.
Harrison, D. et al., “Innovations in Lithography Metrology for Characterization of Phase-Shift Mask Materials”,SPIE(2001) pp. 233-240.
“n&k Analyzer 1512RT”, downloaded Sep. 25, 2001 from <http://www.nandk.com/1512rt.html>, n&k Technology, Inc. (2001).

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