Conductor structure, pixel structure, and methods of forming...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – Plural light emitting devices

Reexamination Certificate

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C438S151000, C257SE33066

Reexamination Certificate

active

07968895

ABSTRACT:
A method for forming a conductor structure is provided. The method comprises: (1) providing a substrate; (2) forming a patterned dielectric layer with a first opening which exposes a portion of the substrate; forming a patterned organic material layer on the dielectric layer with a second opening which corresponds to the first opening and expose the exposed portion of the substrate; (3) forming a first barrier layer on the organic material layer and the exposed portion of the substrate; (4) forming a metal layer on the first barrier layer; and (5) removing the organic material layer, the first barrier layer thereon and the metal layer thereon.

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Taiwan Notice of Allowance mailed Jan. 28, 2011.
English translation of abstract of TW 436995, May 28, 2001.
English translation of abstract of TW200539264A, Dec. 1, 2005.
English translation of abstract of JP2006-278155A, Oct. 12, 2006.
English translation of abstract of JP11-261099A, Sep. 24, 1999.

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