Conductive runner fabrication

Details Conductive runner fabrication Conductive runner fabrication

1994-12-30

1997-02-04

Quach, T. N.

Fishing, trapping, and vermin destroying

437192, 437194, 437197, 437957, H01L 21283

Patent

active

055997376

ABSTRACT:
The method of forming runners having superior stress migration characteristics is disclosed. A blanket layer of conductive material is deposited over a dielectric. A blanket layer is subjected to a blanket-etch back procedure, thereby reducing its thickness by approximately half. The remaining layer is then patterned to form runners. Resulting runners have a superior grain structure and greater resistance to electromigration and stress migration.

REFERENCES:
patent: 5057455 (1991-10-01), Foo et al.
patent: 5141897 (1992-08-01), Manocha et al.
patent: 5202274 (1993-04-01), Bae et al.
patent: 5272110 (1993-12-01), Koyama
patent: 5278448 (1994-01-01), Fujii
Wolf, S., Silicon Processing, Lattice Press, vol. 2, 1990, pp. 124-133, 180-191.
Wolf, S., Silicon Processing, Lattice Press, vol. 2, 1990, pp. 191, 199-207 .

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