Conductive metallization of substrates via developing agents

Coating processes – Electrical product produced – Metal coating

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427337, 427367, 427371, 427370, 4273831, C23C 2400

Patent

active

049976745

ABSTRACT:
A conductive metal layer is formed on a substrate by depositing copper or nickel particles on the substrate, contacting the metal particles with a specified developing agent, and heating the metal particles and the developing agent. The coated substrates have conductive surfaces and are useful for a variety of uses such as EMI shielding and printed circuit boards.

REFERENCES:
patent: 3596842 (1986-06-01), Chung
patent: 4064074 (1977-12-01), Ellis
patent: 4232060 (1980-11-01), Mallory
patent: 4382981 (1983-05-01), Stoetzer et al.
patent: 4508640 (1985-04-01), Kanda
patent: 4572843 (1986-02-01), Saito
patent: 4590115 (1986-05-01), Cassat
patent: 4614837 (1986-09-01), Kane
patent: 4663240 (1987-05-01), Hajdu
patent: 4681712 (1987-07-01), Sakakibara
patent: 4786570 (1988-11-01), Yu
patent: 4795660 (1989-01-01), Cooray
patent: 4799996 (1989-01-01), Cassat
Derwent Abstract 84-176031, Matveeva, 11/07/83.

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