Conductive metal-filled substrates via developing agents

Compositions – Electrically conductive or emissive compositions – Free metal containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

252513, 419 10, 419 31, 419 34, 419 57, H01B 106

Patent

active

049618792

ABSTRACT:
A conductive metal-filled substrate is formed by intermingling copper or nickel particles into the substrate, contacting the metal particles with a specified developing agent, and heating the metal particles and the developing agent. The filled substrates are electrically conductive and are useful for a variety of uses such as EMI shielding.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Conductive metal-filled substrates via developing agents does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Conductive metal-filled substrates via developing agents, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Conductive metal-filled substrates via developing agents will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-972069

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.