Conductive layer deposition method with a microwave enhanced CVD

Details Conductive layer deposition method with a microwave enhanced CVD Conductive layer deposition method with a microwave enhanced CVD

1986-10-09

1988-02-09

Pianalto, Bernard D.

Coating processes

Spray coating utilizing flame or plasma heat

Inorganic carbon containing coating, not as steel

427 47, 427 531, 427 541, 427124, 4271263, 427252, 427253, 4272552, B05D 302

Patent

active

047241594

ABSTRACT:
An improved deposition method for conductive layer is shown. Adverse effects of conductive deposited material on a wall of a reaction chamber is overcome by provision of a multi-chambered system. One chamber is devoted to a resonance space in which process gas is excited by ECR. Another chamber is devoted to a reaction space in which productive gas is decomposed to proceed the deposition.

REFERENCES:
patent: 4568578 (1986-02-01), Arfsten et al.

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