Metallurgical apparatus – With means treating or handling gases exhausted by treating...
Reexamination Certificate
2008-09-09
2010-12-14
Kastler, Scott (Department: 1793)
Metallurgical apparatus
With means treating or handling gases exhausted by treating...
C075S670000
Reexamination Certificate
active
07850901
ABSTRACT:
Embodiments of the invention relate generally to systems used to measure mercury in gaseous emissions. In one aspect, the invention is directed to the use of silicon carbide as material for a thermal pyrolysis unit. In another aspect, at least one of silicon nitride, silicon boride, and/or boron nitride is used as material for a thermal pyrolysis unit. In another aspect, the invention is directed to an improved pyrolyzer design, in which a thermal pyrolysis unit comprises a tailpiece that allows water to be injected at the heated exit of the thermal pyrolysis unit. In another aspect, the invention is directed to the use of a coalescing filter in a scrubbing unit. In another aspect, the invention is directed to the use of a hydrophobic filter element in a scrubbing unit. One or more of these elements may be used in a conditioning module of a continuous emissions monitoring system, for example.
REFERENCES:
patent: 3713776 (1973-01-01), Capuano
patent: 3813330 (1974-05-01), Givens et al.
patent: 3933431 (1976-01-01), Trujillo et al.
patent: 4161883 (1979-07-01), Laird et al.
patent: 4379412 (1983-04-01), Wood
patent: 4484481 (1984-11-01), Laird et al.
patent: 5237881 (1993-08-01), Ross et al.
patent: 5277056 (1994-01-01), Braun et al.
patent: 5361514 (1994-11-01), Lahoda et al.
patent: 5362468 (1994-11-01), Coulon et al.
patent: 5458010 (1995-10-01), Traina et al.
patent: 5597535 (1997-01-01), Schaedlich et al.
patent: 5660795 (1997-08-01), Schaedlich et al.
patent: 5750992 (1998-05-01), Van Pelt et al.
patent: 5808178 (1998-09-01), Rounbehler et al.
patent: 5879948 (1999-03-01), Van Pelt et al.
patent: 6326326 (2001-12-01), Feng et al.
patent: 6475802 (2002-11-01), Schaedlich et al.
patent: 6487920 (2002-12-01), Robbat, Jr.
patent: 6520033 (2003-02-01), Schroeder et al.
patent: 6558626 (2003-05-01), Aker et al.
patent: 6627454 (2003-09-01), Amirav et al.
patent: 6736883 (2004-05-01), Sjostrom et al.
patent: 2001/0041151 (2001-11-01), Gorecki et al.
patent: 2002/0020209 (2002-02-01), Grob et al.
patent: 2002/0068024 (2002-06-01), Park et al.
patent: 2003/0051662 (2003-03-01), Lee et al.
patent: 2003/0110950 (2003-06-01), Sjostrom et al.
patent: 2004/0038414 (2004-02-01), Winkler et al.
patent: 2004/0044110 (2004-03-01), Baay et al.
patent: 2005/0061110 (2005-03-01), Schaedlich et al.
patent: 2006/0042418 (2006-03-01), Schaedlich et al.
patent: 9725612 (1997-07-01), None
patent: 02/23182 (2002-03-01), None
Piper, L.G. et al., Measurement of Mercury and Other Trace Metals in Combustion Gases using Actie Nitrogen Energy Transfer (ANET), Physical Sciences Inc., Andover, MA, pp. 1-8.
Zamzov, Daniel S. et al., “Real-Time Atomic Absorption Mercury Continuous Emission Monitor”, (2003) Review of Scientific Instruments, vol. 74, No. 8, pp. 3774-3783, Dec. 2003.
International Search Report, received on the corresponding PCT application No. PCT/CA2006/000384, as issued on Jul. 5, 2006.
International Preliminary Report on Patentability, received on the related PCT application No. PCT/CA2004/001618, as issued on Mar. 27, 2006.
International Search Report , received on the related PCT application No. PCT/CA2004/001618, as issued on Jan. 24, 2005.
Schaedlich Frank H.
Schneeberger Daniel R.
Bereskin and Parr LLP/ S.E.N.C.R.L., s.r.l.
Kastler Scott
Tekran Instruments Corporation
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