Conditioning of a reaction chamber

Details Conditioning of a reaction chamber Conditioning of a reaction chamber

2006-04-04

2006-04-04

Pert, Evan (Department: 2826)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

Reexamination Certificate

active

07022620

ABSTRACT:
A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber and the environment is regulated to form the polymer on the interior surface of the chamber. Methods for the manufacture of integrated circuits, electronic devices, and electronic systems, are also provided.

REFERENCES:
patent: 3619249 (1971-11-01), Cannon
patent: 4397724 (1983-08-01), Moran
patent: 6080680 (2000-06-01), Lee et al.
patent: 6350697 (2002-02-01), Richardson et al.
patent: 6776851 (2004-08-01), Singh et al.
patent: 2002/0086118 (2002-07-01), Chang et al.

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