Conditioning of a polymeric substrate

Details Conditioning of a polymeric substrate Conditioning of a polymeric substrate

1995-03-30

1996-06-18

Utech, Benjamin

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427553, 427557, 427 98, 427307, 427404, 4274431, H05H 100

Patent

active

055275664

ABSTRACT:
A polymeric substrate is exposed to an oxygen containing plasma; and then exposed to a reducing atmosphere at an elevated temperature. The reducing treatment reverses the effects on the polymer surface chemistry imparted by action of the oxidizing plasma. In this manner, the original electroactive properties of certain polymers are regenerated at the surface.

REFERENCES:
patent: 4112139 (1978-09-01), Shirk et al.
patent: 4287253 (1981-09-01), Leech
patent: 4308301 (1981-12-01), Huss
patent: 4357203 (1982-11-01), Zelez
patent: 4382101 (1983-05-01), Polak
patent: 4395434 (1983-07-01), Imada et al.
patent: 4448804 (1984-05-01), Amelio et al.
patent: 4478883 (1984-10-01), Bupp et al.
patent: 4548867 (1985-10-01), Ueno et al.
patent: 4554182 (1985-11-01), Bupp et al.
patent: 4609445 (1986-09-01), Collins
patent: 4639380 (1987-01-01), Amelio et al.
patent: 4714658 (1987-12-01), Kadajh et al.
patent: 4816115 (1989-03-01), Horner et al.
patent: 4897153 (1990-01-01), Cole et al.
patent: 4956197 (1990-09-01), Babu et al.
patent: 4990363 (1991-02-01), Suhr et al.

Affiliated with

Also associated with

Rating

Conditioning of a polymeric substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Conditioning of a polymeric substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Conditioning of a polymeric substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-221340