Conditioning agents and compositions containing same

Details Conditioning agents and compositions containing same Conditioning agents and compositions containing same

1987-06-10

1990-04-03

Niebling, John F.

Compositions

Dust suppressants for bulk materials, or processes of...

252547, 252DIG5, C11D 930, C11D 948

Patent

active

049138286

ABSTRACT:
Disclosed are alkyl amine-anionic surfactant ion-pair/wax composites useful as fiber- and fabric-conditioning agents. Also disclosed are compositions containing these conditioning agents such as fabric detergent compositions, shampoos, hair conditioners and dryer- and washer-added fabric conditioners.

REFERENCES:
patent: 2691636 (1954-10-01), Stayner et al.
patent: 3055777 (1962-09-01), Grad
patent: 3686025 (1972-08-01), Morton
patent: 3696056 (1972-10-01), Inamorato
patent: 3812044 (1974-05-01), Connor
patent: 3886075 (1975-05-01), Bernadino
patent: 3936537 (1976-02-01), Baskerville, Jr. et al.
patent: 3959155 (1976-05-01), Montgomery
patent: 4049858 (1977-09-01), Murphy
patent: 4058489 (1977-11-01), Hellsten
patent: 4095946 (1978-06-01), Jones et al.
patent: 4126674 (1978-11-01), Mausher
patent: 4173539 (1979-11-01), Rule et al.
patent: 4272386 (1981-06-01), Draper
patent: 4292035 (1981-09-01), Battrell
patent: 4294710 (1981-10-01), Hardy et al.
patent: 4303543 (1981-12-01), Mansy
patent: 4329390 (1980-02-01), Danner
patent: 4375416 (1983-03-01), Crisp et al.
patent: 4557853 (1985-12-01), Collins
patent: 4597898 (1986-07-01), Vander Meer
patent: 4638907 (1987-01-01), Bedenk
patent: 4661267 (1987-04-01), Dekker
patent: 4786369 (1988-11-01), Kanfer

Affiliated with

Also associated with

Rating

Conditioning agents and compositions containing same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Conditioning agents and compositions containing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Conditioning agents and compositions containing same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1355915