Condition assessment system for a structure including a...

Details Condition assessment system for a structure including a... Condition assessment system for a structure including a...

2006-09-28

2008-09-02

Connolly, Patrick J (Department: 2877)

Optics: measuring and testing

By light interference

Holography

C356S521000

Reexamination Certificate

active

07420687

ABSTRACT:
An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at least one of the following occurs: an external force is received by the second portion of the structure and an internal condition occurs in the target portion. The system and method further has a grating shaped and located to produce a first optical interference pattern when the target portion and the grating are exposed to non-invasive illumination and when the target portion has the first feature. Further implementations use a second grating spaced apart from the first grating.

REFERENCES:
patent: 5422723 (1995-06-01), Paranjpe et al.
patent: 5682236 (1997-10-01), Trolinger et al.

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