Concentrated electroless solution for selective deposition...

Details Concentrated electroless solution for selective deposition... Concentrated electroless solution for selective deposition...

2007-07-03

2010-02-09

Klemanski, Helene (Department: 1793)

Compositions: coating or plastic

Coating or plastic compositions

Metal-depositing composition or substrate-sensitizing...

C106S001270

Reexamination Certificate

active

07658790

ABSTRACT:
An electroless solution for deposition of a cobalt-based alloy on a substrate is provided. The electroless solution may be formed by mixing first and second solutions, with the first and second solutions being prepared from concentrated precursors. In one embodiment, the first solution contains a cobalt (Co) ion source and a complexing and deposition selectivity agent. In one embodiment, the cobalt concentration in the first solution is at least 90 millimoles per liter. The second solution contains a reducing agent. In one embodiment, the reducing agent is dimethylamineborane (DMAB) having a concentration of at least 10 grams per liter. In other embodiments, the first solution also contains a tungsten (W) ion source, and either the first or second solution also contains a phosphorous (P) ion source.

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