Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate
2011-06-07
2011-06-07
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
C716S051000, C716S052000
Reexamination Certificate
active
07958462
ABSTRACT:
A computer executable three-dimensional device simulation program product for the purpose of making a three-dimensional device simulation system which generates a three-dimensional model of a device by using a mask data performing the procedures of inputting cross-sectional feature information indicating a cross-sectional feature of an edge part of a mask, and calculating the three-dimensional model based on the mask data and input cross-sectional feature information, thereby enabling an easy generation of a complex three-dimensional feature by using pattern forming-use mask data when generating a three-dimensional feature model of a minute device.
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Japan Patent Office; Office Action mailed Jun. 1 2010, in connection with correspondent patent application No. JP 2006-043812. English-language translation provided.
Hashima Masayoshi
Sato Yuichi
Takeshita Shuji
Dinh Paul
Fujitsu Limited
Fujitsu Patent Center
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