Computer-readable non-transitory medium storing...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle

Reexamination Certificate

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C716S051000, C716S052000

Reexamination Certificate

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07958462

ABSTRACT:
A computer executable three-dimensional device simulation program product for the purpose of making a three-dimensional device simulation system which generates a three-dimensional model of a device by using a mask data performing the procedures of inputting cross-sectional feature information indicating a cross-sectional feature of an edge part of a mask, and calculating the three-dimensional model based on the mask data and input cross-sectional feature information, thereby enabling an easy generation of a complex three-dimensional feature by using pattern forming-use mask data when generating a three-dimensional feature model of a minute device.

REFERENCES:
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patent: 6909930 (2005-06-01), Shishido et al.
patent: 2002/0159167 (2002-10-01), Greenberg
patent: 2004/0101786 (2004-05-01), Meagley
patent: 2005/0048780 (2005-03-01), Tanaka et al.
patent: 2006/0199369 (2006-09-01), Marokkey et al.
patent: 10-41366 (1998-02-01), None
patent: 2000-207433 (2000-07-01), None
patent: 2001-174974 (2001-06-01), None
patent: 2001-230323 (2001-08-01), None
Japan Patent Office; Office Action mailed Jun. 1 2010, in connection with correspondent patent application No. JP 2006-043812. English-language translation provided.

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