Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Mechanical measurement system
Reexamination Certificate
2011-08-16
2011-08-16
Dunn, Drew A (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Mechanical measurement system
Reexamination Certificate
active
08000905
ABSTRACT:
Computer-implemented methods, carrier media, and systems for determining sizes of defects detected on a wafer are provided. One computer-implemented method includes separating the defects into groups based on output acquired for the defects by multiple channels of an inspection system used to detect the defects on the wafer. The method also includes separating the defects in one or more of the groups into subgroups based on the output acquired for the defects by one or more of the multiple channels. In addition, the method includes determining the sizes of one or more of the defects in one or more of the subgroups separately based on the output acquired for the defects by only one of the multiple channels and a calibration parameter. The calibration parameter is different for each of the subgroups and is acquired by using another system to measure actual sizes of defects detected on other wafers.
REFERENCES:
patent: 7474394 (2009-01-01), Hamamatsu et al.
patent: 7599051 (2009-10-01), Labovitz et al.
Stokowski et al. “Wafer Inspection Technology Challenges for ULSI Manufacturing,” AIP Conf. Proc., vol. 449, Nov. 24, 1998, pp. 405-415.
Balakrishnan Subramanian
Chen Stephanie
Wallingford Richard
Ann Marie Mewherter
Cherry Stephen J
Dunn Drew A
KLA-Tencor Technologies Corp.
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