Data processing: structural design – modeling – simulation – and em – Simulating electronic device or electrical system
Reexamination Certificate
2011-01-18
2011-01-18
Rodriguez, Paul L (Department: 2123)
Data processing: structural design, modeling, simulation, and em
Simulating electronic device or electrical system
C356S252000
Reexamination Certificate
active
07873504
ABSTRACT:
Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer at different values of one or more parameters of one or more fabrication processes that will be used to form a metrology target structure on the wafer based on the one or more fabrication processes, one or more parameters of the wafer, and one or more initial metrology target structure designs. The method also includes simulating one or more spectra that will be produced by a predetermined metrology system configuration for each of the simulated one or more initial metrology target structures. In addition, the method includes creating the metrology target structure design based on the one or more spectra.
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KLA-Tencor Technologies Corp.
Louis Andre Pierre
Mewherter Ann Marie
Rodriguez Paul L
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