Computer-implemented method and carrier medium configured to...

Details Computer-implemented method and carrier medium configured to... Computer-implemented method and carrier medium configured to...

2005-11-22

2005-11-22

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S028000, C700S051000

Reexamination Certificate

active

06968253

ABSTRACT:
A computer-implemented method and a carrier medium adapted to generate a set of process parameter values for a lithography process based upon both critical dimension and overlay effect analyses of process parameter value variations is provided. In some cases, the computer-implemented method and a carrier medium may be configured to select a set of process parameter values to collectively minimize the number critical dimension and overlay variation errors produced within an image fabricated from the lithography process.

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Howard et al., “Tuning and simulating a 193 nm resist for 2D applications,” Mar. 2002, 9 pages.
International Search Report, PCT/US2004/014212, mailed May 4, 2005.

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