Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate
2011-06-07
2011-06-07
Doan, Nghia M (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Manufacturing optimizations
C716S050000, C716S051000, C716S052000, C716S053000, C716S055000, C430S005000, C430S030000
Reexamination Certificate
active
07958463
ABSTRACT:
A computer automated method for designing an integrated circuit includes placing a plurality of marks on each of contours of a plurality of patterns allocated in a chip area; dividing the marks into a plurality of groups so that the adjacent marks are merged in a same group; determining one of the groups as a candidate hot spot based on a total number of marks included in each of the groups; and modifying the corresponding pattern in the candidate hot spot.
REFERENCES:
patent: 6539519 (2003-03-01), Meeker
patent: 6553558 (2003-04-01), Palmer et al.
patent: 6631307 (2003-10-01), Tzu et al.
patent: 6668367 (2003-12-01), Cobb et al.
patent: 6952818 (2005-10-01), Ikeuchi
patent: 7194707 (2007-03-01), Kotani et al.
patent: 08-137087 (1996-05-01), None
patent: 2000-187314 (2000-07-01), None
patent: 2003-162041 (2003-06-01), None
patent: 2003-257842 (2003-09-01), None
patent: 2004-302110 (2004-10-01), None
Official Office Action Letter issued on Feb. 10, 2009, in Taiwan application No. 094137590, including Japanese language translation thereof.
DLA Piper (LLP) US
Doan Nghia M
Kabushiki Kaisha Toshiba
LandOfFree
Computer automated method for manufacturing an integrated... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Computer automated method for manufacturing an integrated..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Computer automated method for manufacturing an integrated... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2668009