Comprehensive integrated lithographic process control system...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C700S121000, C438S014000

Reexamination Certificate

active

06915177

ABSTRACT:
The present invention provides systems and methods that facilitate performing fabrication process. Critical parameters are valued collectively as a quality matrix, which weights respective parameters according to their importance to one or more design goals. The critical parameters are weighted by coefficients according to information such as, product design, simulation, test results, yield data, electrical data and the like. The invention then can develop a quality index which is a composite “score” of the current fabrication process. A control system can then do comparisons of the quality index with design specifications in order to determine if the current fabrication process is acceptable. If the process is unacceptable, test parameters can be modified for ongoing processes and the process can be re-worked and re-performed for completed processes. As such, respective layers of a device can be customized for different specifications and quality index depending on product designs and yields.

REFERENCES:
patent: 5351202 (1994-09-01), Kurtzberg et al.
patent: 5438527 (1995-08-01), Feldbaumer et al.
patent: 5481475 (1996-01-01), Young
patent: 5546312 (1996-08-01), Mozumder et al.
patent: 5642296 (1997-06-01), Saxena
patent: 5822218 (1998-10-01), Moosa et al.
patent: 6248602 (2001-06-01), Bode et al.
patent: 6274394 (2001-08-01), Cha
patent: 6301516 (2001-10-01), Ostrowski et al.
patent: 6470231 (2002-10-01), Yang et al.
patent: 6535775 (2003-03-01), Bagepalli et al.
patent: 6582618 (2003-06-01), Toprac et al.
patent: 2002/0072003 (2002-06-01), Brill et al.
patent: 2002/0169581 (2002-11-01), Sarfert
patent: 2003/0040948 (2003-02-01), Sakaguchi
patent: 2003/0083757 (2003-05-01), Card et al.
patent: 0 660 385 (1995-06-01), None
patent: 1 253 497 (2002-10-01), None
patent: WO 01/80306 (2001-10-01), None
patent: WO 02/077589 (2002-10-01), None
International Search Report, PCT/US 03/28682, mailed May 3, 2004.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Comprehensive integrated lithographic process control system... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Comprehensive integrated lithographic process control system..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Comprehensive integrated lithographic process control system... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3415812

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.