Compound semiconductor device with superlattice channel region

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 16, 357 4, H01L 29205, H01L 2980

Patent

active

048946915

ABSTRACT:
A compound semiconductor device having a channel layer which is made of periodically laminated structure of thin-film layers of compound semiconductor substantially being different from each other. The difference of energy between the conduction band and the valence band of compound semiconductor thin-film layers of one side is less than that of the other side thin-film layers, moreover the electron mobility in low electric field application in the thin-film layers of compound semiconductor of one side is greater than that of the other side thin-film layers, besides the electron mobility in high electric field application in the thin-film layers of compound semiconductor of one side is less than that of the other side thin-film layers, and/or the impact ionization of valence electron generated in high electric field application takes place earlier than the thin-film layers of compound semiconductor of the other side. While conduction electron preferentially flows through the thin-film layers of compound semiconductor of one side in low electric field application, and conversely, while conduction electron having substantial energy intensified by acceleration preferentially flows through other side thin-film layers in high electric field application.

REFERENCES:
patent: 4194935 (1980-03-01), Dingle et al.
patent: 4688061 (1987-08-01), Sakaki
patent: 4697197 (1987-09-01), Dresner
patent: 4797716 (1989-01-01), Chaffin et al.
Tamargo et al., Appl. Phys. Lett. 46 (6) 15 Mar. 85, pp. 569-571, "Growth of a Novel InAs-GaAs . . . ".
Zipperian et al., "An In.sub.2 Ga.sub.2 As/GaAs . . . Transistor", Int. Elec. Dev. Meet. 1983, Wash. D.C., pp. 696-699.
Milnes, "Semiconductor . . . Overview", Solid State Electronics, vol. 29, No. 2, pp. 99-121, 1986 Feb.
Bhattacharya et al., "Material . . . Review", Solid State Electronics, vol. 29, No. 2, pp. 261-267, Feb. 1986.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Compound semiconductor device with superlattice channel region does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Compound semiconductor device with superlattice channel region, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compound semiconductor device with superlattice channel region will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1338049

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.