Compound semiconductor device and method for surface treatment

Details Compound semiconductor device and method for surface treatment Compound semiconductor device and method for surface treatment

1990-06-20

1991-08-13

Wojciechowicz, Edward J.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

357 17, 357 55, 357 72, 427 50, 427 51, 437235, 437241, 437243, H01L 2934, H01L 2102, B05D 314

Patent

active

050400444

ABSTRACT:
According to the present invention, roughness are formed on the surface of III-V group compound semiconductor to prevent total reflection, and SiNx film is formed on rough surface. This makes it possible to increase external quantum efficiency by surface roughness. Further, bond strength is increased because SiNx film is furnished on the roughness. As the result, the detachment of SiNx film is prevented, moisture resistant property is improved, and service life of LED is extended by preventing oxidation.

REFERENCES:
patent: 4916513 (1990-04-01), Li

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