Compound semiconductor device and a method of manufacturing the

Fishing – trapping – and vermin destroying

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148DIG17, 148DIG26, 148DIG97, 148DIG169, 156612, 437 90, 437 85, 437 99, 437107, 437132, 437939, 437946, 437976, H01L 21203, H01L 2120

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049258109

ABSTRACT:
A compound semiconductor device comprises a substrate formed from a single crystal of silicon, a layer of an insulator formed on a portion of a surface of the substrate, at least one layer of a high resistance compound semiconductor formed on the insulator layer, and at least one layer of a single crystal of a compound semiconductor formed on a different portion of the substrate surface from the insulator layer. The device can be manufactured by forming an insulator layer on one portion of a surface of a single crystal silicon substrate, and growing a compound semiconductor by epitaxy on the insulator layer and on the different portion from the insulator layer. One of useful applications is a hybrid semiconductor device having a compound semiconductor formed from e.g. GaAs on a silicon substrate.

REFERENCES:
patent: 3766447 (1973-10-01), Mason
patent: 4551394 (1985-11-01), Betsch et al.
patent: 4614564 (1986-09-01), Sheldon et al.
patent: 4657603 (1987-04-01), Kruehler et al.
patent: 4707216 (1987-11-01), Morkoc et al.
Choi et al., "Monolithic Integration of Si and GaAs Devices," Mat. Res. Soc. Symp., vol. 67, 1986, pp. 165-171.
Fischer et al., "Monolithic Integration of GaAs/AlGaAs . . . Silicon Circuits," Appl. Phys. Lett., 49(9), 1 Nov. 1985, pp. 983-985.
Otsuka et al., "Observation of GaAs/Si Epitaxial Interfaces . . . ," Mat. Res. Soc. Symp., vol. 67, 1986, pp. 85-92.
Wang, "Molecular Beam Epitaxial Growth and Material Properties of GaAs and AlGaAs on Si(100)," Appl. Phys. Lett. 44(12), 15 Jun. 1984, pp. 1149-1151.
Takahashi et al., "Selective MOCVD Growth of GaAlAs on Partly Masked Substrates . . . ", J. Grys. Growth 68(1984), pp. 206-213.
Lee et al., ". . . Selective-Area Molecular Beam Epitaxy of GaAs Film on Si Substrate," Appl. Phys. Lett. 52(3), 18 Jan. 1988, pp. 215-217.
Metze et al., ". . . GaAs Layers Grown Directly on Si Substrates by Molecular Beam Epitaxy," Appl. Phys. Lett. 45(10), 15 Nov. 1984, pp. 1107-1109.
Masselink et al., "Optical Properties of GaAs on (100)Si Using Molecular Beam Epitaxy," Appl. Phys. Lett., 45, 1984, pp. 1309-1311.

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