Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With particular semiconductor material
Reexamination Certificate
2006-09-06
2011-12-27
Parker, Kenneth (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Incoherent light emitter structure
With particular semiconductor material
C257S627000, C257S628000
Reexamination Certificate
active
08084781
ABSTRACT:
A compound semiconductor device (1) includes a compound semiconductor having a stacked structure (100) of a hexagonal single crystal layer (101), a boron phosphide-based semiconductor layer (102) formed on a surface of the hexagonal single crystal layer and a compound semiconductor layer (103) disposed on the boron phosphide-based semiconductor layer, and electrodes (108, 109) disposed on the stacked structure, wherein the boron phosphide-based semiconductor layer is formed of a hexagonal crystal disposed on a surface formed of a (1.1.-2.0.) crystal face of the hexagonal single crystal layer.
REFERENCES:
patent: 6072197 (2000-06-01), Horino et al.
patent: 2004/0169184 (2004-09-01), Udagawa et al.
patent: 55-3834 (1980-01-01), None
patent: 02-275682 (1990-11-01), None
patent: 2-275682 (1990-11-01), None
patent: 02-288371 (1990-11-01), None
patent: 2-288371 (1990-11-01), None
patent: 2-288388 (1990-11-01), None
patent: 03-024770 (1991-02-01), None
patent: 03-211888 (1991-09-01), None
patent: 4-84486 (1992-03-01), None
patent: 4-213878 (1992-08-01), None
patent: 09-232685 (1997-09-01), None
patent: 10-287497 (1998-10-01), None
patent: 2002-232000 (2002-08-01), None
patent: 2002-368260 (2002-12-01), None
patent: 2003-309284 (2003-10-01), None
patent: 2004-146424 (2004-05-01), None
patent: 2004-179444 (2004-06-01), None
patent: 2004-186291 (2004-07-01), None
patent: 2005-005657 (2005-01-01), None
patent: 2005-093991 (2005-04-01), None
Takashi Udagawa, et al.; “Heteroepitaxial growth of boronphosphide III-V semiconductor on silicon by organometallic chemical vapor deposition”; Journal of Ceramic Processing Research; vol. 4, No. 2 (2003); pp. 80-83.
T. Udagawa, et al.; High resolution TEM characterization of MOVPE-grown (1 1 1)-BP layer on hexagonal 6H (0 0 0 1)-SiC; Applied Surface Science; No. 244 (2005); pp. 285-288.
Kimiyasu Saka; “Crystal Electronmicroscopy”; Material Engineering Series; Uchida Rokakuho Publishing Co., Ltd; Nov. 25, 1997; pp. 64-65.
Yoshihisa Abe, et al.; “SiC epitaxial growth on Si(0 0 1) substrates using a BP buffer layer”; Journal of Crystal Growth; No. 283 (2005); pp. 41-47.
Kimiyasu Saka; “Crystal Electronmicroscopy”; Material Engineering Series; Uchida Rokakuho Publishing Co., Ltd; Nov. 25, 1997; pp. 2-7.
Brian R. Pamplin; “Crystal Growth”; (International Series of monographs on the science of the solid state); vol. 6; 1975; pp. 4-5.
T. Udagawa, et al.; “Lattice-matched boronphosphide (BP)/hexagonal GaN heterostructure for inhibition of dislocation penetration”; phys. stat. sol. (c) 0; No. 7 (2003); pp. 2027-2030.
J.C. Phillips; “Bonds and Bands in Semiconductors”; Academic Press; 1973; pp. 50-51.
Page Dale E
Parker Kenneth
Showa Denko K.K.
Sughrue & Mion, PLLC
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