Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With heterojunction
Reexamination Certificate
2008-05-06
2008-05-06
Huynh, Andy (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Incoherent light emitter structure
With heterojunction
C257S094000, C257S096000, C257S099000, C257S103000, C257S057000, C257S059000, C257S072000, C257S083000, C257S257000, C257S290000, C257S351000, C257S368000, C257S392000
Reexamination Certificate
active
07368757
ABSTRACT:
A back electrode6is formed in the back of a Si single crystal substrate2of a compound semiconductor in which an n-type 3C-SiC single crystal buffer layer3having a thickness of 0.05-2 μm, a carrier concentration of 1016-1021/cm3, a hexagonal InwGaxAl1-w-xN single crystal buffer layer4(0≦w<1, 0≦x<1, w+x<1) having a thickness of 0.01-0.5 μm, and an n-type hexagonal InyGazAl1-y-zN single crystal layer5(0≦y<1, 0<z≦1, y+z≦1) having a thickness of 0.1-5 μm and a carrier concentration of 1011-1016/cm3are stacked in order on an n-type Si single crystal substrate top2having a crystal-plane orientation {111}, a carrier concentration of 1016-1021/cm3, and a surface electrode7is formed on a surface of a hexagonal InyGazAl1-y-zN single crystal layer5, so as to provide a compound semiconductor device which causes little energy loss and allows an high efficiency and a high breakdown voltage.
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S. Nishino et al., “Epitaxial Growth and Electric Characteristics of Cubic SiC on Silicon”, J. Appl. Phys., vol. 61, No. 10, May 15, 1997, pp. 4889-4893.
Abe Yoshihisa
Komiyama Jun
Nakanishi Hideo
Suzuki Shunichi
Covalent Materials Corporation
Foley & Lardner LLP
Huynh Andy
Tran Tony
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