Compound, polymer, and radiation-sensitive composition

Details Compound, polymer, and radiation-sensitive composition Compound, polymer, and radiation-sensitive composition

2006-05-11

2010-10-12

Wu, David (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S287000, C568S028000, C560S220000, C430S270100

Reexamination Certificate

active

07812105

ABSTRACT:
A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2),wherein R4represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.

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