Compound flow plasma reactor

Details Compound flow plasma reactor Compound flow plasma reactor

1985-04-26

1986-09-30

Terapane, John F.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

42218604, 422906, 204298, 156345, B01J 1908, H05H 100, H05H 124

Patent

active

046146393

ABSTRACT:
A plasma reactor is described in which radially outward and radially inward gas flows are adjusted to maintain uniformity for different wafer sizes and to compensate for loading effects. Inlet ports are provided about the sides of a reactor chamber and at a central position in the top of the chamber, the latter being provided with a flared, tubular structure. Exhaust ports are located about the sides of the chamber. The gas flow from the side inlet ports may have a tangential component.

REFERENCES:
patent: 3859535 (1975-01-01), Bartz
patent: 4209357 (1980-06-01), Gorin et al.

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