Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Processes of preparing a desired or intentional composition...
Patent
1986-05-27
1989-05-30
Ziegler, Jacob
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Processes of preparing a desired or intentional composition...
524336, 524337, 524611, 525 68, 525 92, 525905, C08K 534
Patent
active
048352012
ABSTRACT:
The ultraviolet light stability of polyphenylene ether resins and blends is improved by the addition of small amounts of certain 2-hydroxy-4-hydroxylated alkyl ether benzophenones and hindered amines in combination. The benzophenones are specifically characterized by an alkoxy substituent which contains one or more pendent hydroxy groups. Comparison with the closest prior art shows better UV performance. Plasticized, flame retardant and filled versions are also disclosed.
REFERENCES:
patent: 3086988 (1963-04-01), Gordon
patent: 3925509 (1975-12-01), Cooper et al.
patent: 4016138 (1977-04-01), Anderson
patent: 4024093 (1977-05-01), Abolins
patent: 4288631 (1981-09-01), Ching
patent: 4315848 (1982-02-01), Dester et al.
patent: 4373055 (1983-02-01), Hoaf et al.
patent: 4385146 (1983-05-01), Axelrod
patent: 4444934 (1984-04-01), Kasahara et al.
A. R. Patel et al. "Ultraviolet Stabilization of Polymers: Development with Hindered-Amine Light Stabilizers".
Stabilization & Degradation of Polymers, David L. Allara et al., Advances in Chemical Series No. 169, American Chemical Society, D.C. 116-132 (1978).
General Electric Company
Ziegler Jacob
LandOfFree
Compositions of polyphenylene ether resin and high impact polyst does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Compositions of polyphenylene ether resin and high impact polyst, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compositions of polyphenylene ether resin and high impact polyst will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2153163