Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2008-04-22
2008-04-22
Webb, Gregory (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C252S079300
Reexamination Certificate
active
07361631
ABSTRACT:
A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.
REFERENCES:
patent: 5320709 (1994-06-01), Bowden et al.
patent: 5571447 (1996-11-01), Ward et al.
patent: 5698503 (1997-12-01), Ward et al.
patent: 5709756 (1998-01-01), Ward et al.
patent: 5798323 (1998-08-01), Honda et al.
patent: 5972862 (1999-10-01), Torii et al.
patent: 6030932 (2000-02-01), Leon et al.
patent: 6191086 (2001-02-01), Leon et al.
patent: 6245155 (2001-06-01), Leon et al.
patent: 6492311 (2002-12-01), Lee et al.
patent: 2004/0016904 (2004-01-01), Baum
patent: 0827188 (1998-03-01), None
patent: 0901160 (1999-03-01), None
patent: 9830667 (1998-07-01), None
Egbe Matthew I.
Peters Darryl W.
Rieker Jennifer M.
Ward Irl E.
Air Products and Chemicals Inc.
Morris-Oskanian Rosaleen P.
Rossi Joseph D.
Webb Gregory
LandOfFree
Compositions for the removal of organic and inorganic residues does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Compositions for the removal of organic and inorganic residues, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compositions for the removal of organic and inorganic residues will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2772800