Compositions for production of electronic coatings

Details Compositions for production of electronic coatings Compositions for production of electronic coatings

1990-06-22

1991-04-09

Bell, Janyce

Coating processes

Centrifugal force utilized

427 57, 427123, 4273855, 4273935, 4273936, 437231, B05D 512, H01L 21469

Patent

active

050063707

ABSTRACT:
In humid atmospheres (e.g., 55% relative humidity or above) solutions of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride/2,2-bis [4-(aminophenoxy)phenyl]hexafluoropropane polyamic acid polymers tend to be unstable in the sense that during spin coating operations undesirable precipitate formation may occur on the rotating surface of a semiconductor wafer. The result is the formation of unacceptable coatings due to their irregularity and lack of uniformity. Described are solutions of these polyamic acid polymers in a solvent containing at least 40% by weight of one or more liquid aromatic hydrocarbons having a boiling point of at least about 110.degree. C. and at least 5% by weight of one or more dipolar aprotic solvents having a boiling point of at least about 150.degree. C., such that the solution (a) contains on a weight basis from about 5% to about 40% of the polyamic acid and (b) does not undergo precipitate formation during spin coating in an atmosphere of up to at least about 55% relative humidity.

REFERENCES:
patent: 4172907 (1979-10-01), Mones
patent: 4203922 (1980-05-01), Jones et al.

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