Compositions for preparing low dielectric materials

Details Compositions for preparing low dielectric materials Compositions for preparing low dielectric materials

2006-10-17

2006-10-17

Ghyka, Alexander (Department: 2812)

Active solid-state devices (e.g., transistors, solid-state diode

With means to control surface effects

Insulating coating

C257SE21261, C257SE21273, C438S780000, C438S781000

Reexamination Certificate

active

07122880

ABSTRACT:
Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.

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