Compositions for dark-field polymerization and method of...

Details Compositions for dark-field polymerization and method of... Compositions for dark-field polymerization and method of...

2008-04-29

2008-04-29

Berman, Susan (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

C522S172000, C526S279000

Reexamination Certificate

active

07365103

ABSTRACT:
A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.

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